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Issue Date	Title Author(s) Journal	View
2021-07-06	Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect Kim, Youn-Hye ; Kotsugi, Yohei ; Cheon, Taehoon ; Ramesh, Rahul ; Kim, Soo-Hyun 24th Annual IEEE International Interconnect Technology Conference, IITC 2021, 2021-07-06	11
2022-09	Development of RuS2 for near-infrared photodetector by atomic layer deposition and post-sulfurization Nakazawa, Tatsuya ; Kim, Donghyun ; Kim, Jaehyeok ; Kotsugi, Yohei ; Cheon, Taehoon ; Chung, Seung-Min ; Kim, Soo-Hyun ; Kim, Hyungjun Rare Metals, v.41, no.9, pp.3086 - 3099, 2022-09	110

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